Research

1.     Plasma Semiconductor Processing &Surface interaction

-      Low pressure plasma application for Semiconductor processing 

-   Development of ALE plasma basic technology

-   Characterization of Magnetized CCP and Dual ICP

-    Plasma irradiated photon effects on the surfaces

-      Surface modification and polymer deposition

2.     Plasma diagnostics

-      Optical Emission Spectroscopy and Absorption Spectroscopy

-      Spectroscopic measurement of plasma parameters

-      UV/VUV emission and absorption spectroscopy 

-   Mid-IR laser absoprtion spectroscopy 

-   Plasma and chamber monitoring with GHz vector network analyzer

3.     Atmospheric pressure plasma (APP) applications

-      Surface functionalization using APP treatment

Oil-water separation membrane, Adhesion Enhancement. Surface wettability control

-      Fast thin-layer deposition

TiO2, SiO2, AlO2 deposition, low-k material deposition

-      Surface cleaning and sterilization

-    Plasma source development for bio-medical application

4.     Plasma-Gas conversion

-     Reduction of Carbon-based byproduct by plasma 

-    Synthetic gas or Hydrogen production 

5.     Thermal plasma application (with High-entalphy Plasma Research Center)

-      Boron nitride nanotube (BNNT) synthesis

-      Ultra-high temperature ceramic coatings